Low interface trap density in scaled bilayer gate oxides on 2D materials via nanofog low temperature atomic layer deposition

Kwak, Iljo / Kavrik, Mahmut / Park, Jun Hong et al. | British Library Online Contents | 2019

Atomic layer deposition of ZnO transparent conducting oxides

Yamada, A. / Sang, B. / Konagai, M. | British Library Online Contents | 1997

Characteristics of ZrO~2/Al~2O~3 Bilayer Film for Gate Dielectric Applications Deposited by Atomic Layer Deposition Method

Kim, Y. D. / Lee, J. H. / Koo, J. H. et al. | British Library Online Contents | 2004

Novel materials by atomic layer deposition and molecular layer deposition

Leskela, M. / Ritala, M. / Nilsen, O. | British Library Online Contents | 2011

Investigation of gate edge effect on interface trap density in 3C-SiC MOS capacitors

Gutt, T. / Malachowski, T. / Przewlocki, H. M. et al. | British Library Online Contents | 2012