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Low temperature growth of polycrystalline InN films on non-crystalline substrates by plasma-enhanced atomic layer deposition
Low temperature growth of polycrystalline InN films on non-crystalline substrates by plasma-enhanced atomic layer deposition
Low temperature growth of polycrystalline InN films on non-crystalline substrates by plasma-enhanced atomic layer deposition
Peng, Hong (Autor:in) / Feng, Xingcan (Autor:in) / Gong, Jinhui (Autor:in) / Wang, Wei (Autor:in) / Liu, Hu (Autor:in) / Quan, Zhijue (Autor:in) / Pan, Shuan (Autor:in) / Wang, Li (Autor:in)
Applied surface science ; 459 ; 830-834
01.01.2018
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.44
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