A platform for research: civil engineering, architecture and urbanism
Low temperature growth of polycrystalline InN films on non-crystalline substrates by plasma-enhanced atomic layer deposition
Low temperature growth of polycrystalline InN films on non-crystalline substrates by plasma-enhanced atomic layer deposition
Low temperature growth of polycrystalline InN films on non-crystalline substrates by plasma-enhanced atomic layer deposition
Peng, Hong (author) / Feng, Xingcan (author) / Gong, Jinhui (author) / Wang, Wei (author) / Liu, Hu (author) / Quan, Zhijue (author) / Pan, Shuan (author) / Wang, Li (author)
Applied surface science ; 459 ; 830-834
2018-01-01
5 pages
Article (Journal)
English
DDC:
620.44
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
British Library Online Contents | 2018
|British Library Online Contents | 2019
|British Library Online Contents | 2006
|British Library Online Contents | 2013
|XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition
British Library Online Contents | 2014
|