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Double-stacked gate insulators SiOx/TaOx for flexible amorphous InGaZnO thin film transistors
Double-stacked gate insulators SiOx/TaOx for flexible amorphous InGaZnO thin film transistors
Double-stacked gate insulators SiOx/TaOx for flexible amorphous InGaZnO thin film transistors
Dong, Chengyuan (Autor:in) / Liu, Guochao (Autor:in) / Zhang, Ying (Autor:in) / Feng, Guofeng (Autor:in) / Zhou, Yan (Autor:in)
Materials science in semiconductor processing ; 96 ; 99-103
01.01.2019
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.38152
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