Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Target material forming and pressing method based on cold isostatic pressing
The invention discloses a target material forming and pressing method based on cold isostatic pressing, and belongs to the technical field of ITO target material processing, the method comprises the following steps: S1, preparation of ITO nano powder: preparing the ITO nano powder at the temperature of 300 DEG C or below; s2, preparation of solid powder: putting the ITO nano powder into a mold, and pressurizing; then taking out the ITO nano powder from the mold, crushing and sieving to form ITO solid powder; s3, preparation of an ITO tubular biscuit: loading the ITO solid powder into a tubular flexible mold, and preparing the ITO tubular biscuit through cold isostatic pressing; and s4, preparation of the ITO rotating target material: putting the ITO tubular biscuit into an oxygen atmosphere sintering furnace, introducing oxygen, and carrying out heat preservation sintering to prepare the ITO rotating target material. The method solves the problem that the ITO rotating target biscuit subjected to cold isostatic pressing is easy to crack in the processes of forming, transporting, processing and the like.
本发明公开了一种基于冷等静压的靶材成型压制方法，属于ITO靶材加工技术领域，该方法包括以下步骤：S1、ITO纳米粉的制备：在300℃以下的温度下，制得ITO纳米粉；S2、实心粉料的制备：将ITO纳米粉装入模具中，加压；然后从模具中取出ITO纳米粉，粉碎后过筛，形成ITO实心粉料；S3、ITO管状素坯的制备：将ITO实心粉料装入管状柔性模具中，经冷等静压制成ITO管状素坯；S4、ITO旋转靶材的制备：将ITO管状素坯放入氧气氛烧结炉中，通入氧气，保温烧结制成ITO旋转靶材。本发明解决了经冷等静压成型的ITO旋转靶素坯在成型、运输、加工等过程中容易出现开裂的问题。
Target material forming and pressing method based on cold isostatic pressing
The invention discloses a target material forming and pressing method based on cold isostatic pressing, and belongs to the technical field of ITO target material processing, the method comprises the following steps: S1, preparation of ITO nano powder: preparing the ITO nano powder at the temperature of 300 DEG C or below; s2, preparation of solid powder: putting the ITO nano powder into a mold, and pressurizing; then taking out the ITO nano powder from the mold, crushing and sieving to form ITO solid powder; s3, preparation of an ITO tubular biscuit: loading the ITO solid powder into a tubular flexible mold, and preparing the ITO tubular biscuit through cold isostatic pressing; and s4, preparation of the ITO rotating target material: putting the ITO tubular biscuit into an oxygen atmosphere sintering furnace, introducing oxygen, and carrying out heat preservation sintering to prepare the ITO rotating target material. The method solves the problem that the ITO rotating target biscuit subjected to cold isostatic pressing is easy to crack in the processes of forming, transporting, processing and the like.
本发明公开了一种基于冷等静压的靶材成型压制方法，属于ITO靶材加工技术领域，该方法包括以下步骤：S1、ITO纳米粉的制备：在300℃以下的温度下，制得ITO纳米粉；S2、实心粉料的制备：将ITO纳米粉装入模具中，加压；然后从模具中取出ITO纳米粉，粉碎后过筛，形成ITO实心粉料；S3、ITO管状素坯的制备：将ITO实心粉料装入管状柔性模具中，经冷等静压制成ITO管状素坯；S4、ITO旋转靶材的制备：将ITO管状素坯放入氧气氛烧结炉中，通入氧气，保温烧结制成ITO旋转靶材。本发明解决了经冷等静压成型的ITO旋转靶素坯在成型、运输、加工等过程中容易出现开裂的问题。
Target material forming and pressing method based on cold isostatic pressing
一种基于冷等静压的靶材成型压制方法
TANG ZHIYONG (Autor:in)
08.06.2021
Patent
Elektronische Ressource
Chinesisch
IPC:
C04B
Kalk
,
LIME
/
B01J
Chemische oder physikalische Verfahren, z.B. Katalyse oder Kolloidchemie
,
CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY
/
B28B
Formgeben von Ton oder anderen keramischen Stoffzusammensetzungen, Schlacke oder von Mischungen, die zementartiges Material enthalten, z.B. Putzmörtel
,
SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS, SLAG OR MIXTURES CONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER
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