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Zirconium oxide body to be cut for dental cutting, containing indium and yttrium
The present invention addresses the problem of requiring a technique for imparting a zirconia sintered body with high light transmittance similar to that of a natural tooth enamel. This zirconia body to be cut for dental cutting contains, as a stabilizer, an yttrium compound and an indium compound, the content of the yttrium compound in terms of oxide being 3.0-6.0 mol%, the content of the indium compound in terms of oxide being 0.2-3.0 mol%, and the content of the yttrium compound in terms of oxide being 3.0-6.0 mol%. The total content of the yttrium compound and the indium compound in terms of oxides is 5.5-7.0 mol%.
本发明的课题是需要一种赋予氧化锆烧结体与天然牙牙釉质同样的高透光性的技术。本发明的牙科切削加工用氧化锆被切削体,其中,作为稳定剂包含钇化合物和铟化合物,钇化合物的以换算为氧化物计的含量为3.0mol%~6.0mol%,铟化合物的以换算为氧化物计的含量为0.2mol%~3.0mol%,钇化合物和铟化合物的以换算为氧化物计的合计含量为5.5mol%~7.0mol%。
Zirconium oxide body to be cut for dental cutting, containing indium and yttrium
The present invention addresses the problem of requiring a technique for imparting a zirconia sintered body with high light transmittance similar to that of a natural tooth enamel. This zirconia body to be cut for dental cutting contains, as a stabilizer, an yttrium compound and an indium compound, the content of the yttrium compound in terms of oxide being 3.0-6.0 mol%, the content of the indium compound in terms of oxide being 0.2-3.0 mol%, and the content of the yttrium compound in terms of oxide being 3.0-6.0 mol%. The total content of the yttrium compound and the indium compound in terms of oxides is 5.5-7.0 mol%.
本发明的课题是需要一种赋予氧化锆烧结体与天然牙牙釉质同样的高透光性的技术。本发明的牙科切削加工用氧化锆被切削体,其中,作为稳定剂包含钇化合物和铟化合物,钇化合物的以换算为氧化物计的含量为3.0mol%~6.0mol%,铟化合物的以换算为氧化物计的含量为0.2mol%~3.0mol%,钇化合物和铟化合物的以换算为氧化物计的合计含量为5.5mol%~7.0mol%。
Zirconium oxide body to be cut for dental cutting, containing indium and yttrium
包含铟和钇的牙科切削加工用氧化锆被切削体
NONAKA KAZUMICHI (Autor:in) / TAKAHASHI SHUHEI (Autor:in)
19.04.2022
Patent
Elektronische Ressource
Chinesisch
DENTAL ZIRCONIA MILL BLANK FOR CUTTING AND MACHINING INCLUDING INDIUM AND YTTRIUM
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