Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
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Film-removing water-based barrier slurry for semiconductor nano electrothermal film
The invention relates to water-based barrier slurry for removing a semiconductor nano electrothermal film. The barrier slurry provided by the invention contains silicon dioxide, calcium oxide, active magnesium oxide, magnesium oxide and distilled water, and the whole slurry is quick and simple to prepare, can be used after being prepared, has high economic benefit, can be industrially and stably produced in a large scale, does not crack after being sintered at high temperature, and can perfectly cover an insulating part of a coating substrate to prevent coating; and the coating is easy to clean after high-temperature sintering, can be removed by wiping with hands, and is cleaner and faster to wash with water. Before the semiconductor nano electrothermal film barrier slurry is used in a coating process, a semiconductor nano electrothermal film can be prevented from being coated at an insulating part of a substrate, and then film removal processing is not needed, so that the production efficiency of a semiconductor nano electrothermal film heating body is greatly improved.
本发明涉及一种半导体纳米电热膜除膜水基阻隔浆料。本发明提供了阻隔浆料，其中含有二氧化硅、氧化钙、活性氧化镁、氧化镁、蒸馏水，整个浆料制作快速简单，可以即配即用，经济效益高，可大批量工业化稳定生产，经高温烧结后不会开裂，可以完美的覆盖在镀膜基体的绝缘处防止镀膜，且经高温烧结后易清洗，用手擦拭即可除去，用水冲洗更清洁快速。半导体纳米电热膜阻隔浆料使用在镀膜工艺之前，可以防止半导体纳米电热膜镀膜在基体绝缘处，之后无需再做除膜加工处理，极大的提高了半导体纳米电热膜发热体的生产效率。
Film-removing water-based barrier slurry for semiconductor nano electrothermal film
The invention relates to water-based barrier slurry for removing a semiconductor nano electrothermal film. The barrier slurry provided by the invention contains silicon dioxide, calcium oxide, active magnesium oxide, magnesium oxide and distilled water, and the whole slurry is quick and simple to prepare, can be used after being prepared, has high economic benefit, can be industrially and stably produced in a large scale, does not crack after being sintered at high temperature, and can perfectly cover an insulating part of a coating substrate to prevent coating; and the coating is easy to clean after high-temperature sintering, can be removed by wiping with hands, and is cleaner and faster to wash with water. Before the semiconductor nano electrothermal film barrier slurry is used in a coating process, a semiconductor nano electrothermal film can be prevented from being coated at an insulating part of a substrate, and then film removal processing is not needed, so that the production efficiency of a semiconductor nano electrothermal film heating body is greatly improved.
本发明涉及一种半导体纳米电热膜除膜水基阻隔浆料。本发明提供了阻隔浆料，其中含有二氧化硅、氧化钙、活性氧化镁、氧化镁、蒸馏水，整个浆料制作快速简单，可以即配即用，经济效益高，可大批量工业化稳定生产，经高温烧结后不会开裂，可以完美的覆盖在镀膜基体的绝缘处防止镀膜，且经高温烧结后易清洗，用手擦拭即可除去，用水冲洗更清洁快速。半导体纳米电热膜阻隔浆料使用在镀膜工艺之前，可以防止半导体纳米电热膜镀膜在基体绝缘处，之后无需再做除膜加工处理，极大的提高了半导体纳米电热膜发热体的生产效率。
Film-removing water-based barrier slurry for semiconductor nano electrothermal film
一种半导体纳米电热膜除膜水基阻隔浆料
LUO HAO (Autor:in) / YANG XIAOHUA (Autor:in) / CAI JIANCAI (Autor:in)
06.05.2022
Patent
Elektronische Ressource
Chinesisch
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