Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Protective glaze suitable for firing in low-temperature fast firing kiln, ceramic tile and preparation method thereof
The invention discloses a protective glaze suitable for firing in a low-temperature fast firing kiln and a ceramic tile and a preparation method thereof, and the protective glaze comprises the following chemical components of raw materials in percentage by weight: SiO2, Al2O3, CaO, MgO, K2O, Na2O and ignition loss; the firing temperature of the protective glaze in a low-temperature fast firing kiln is 1199-1230 DEG C, and the firing time is 50-55 minutes; the tension of the protective glaze effectively prevents bubbles generated in the cover glaze layer, the ink jet layer and the pressed green body from breaking through the glaze layer; according to the ceramic tile fired in the low-temperature fast firing kiln, the protective glaze is applied above the ink jet layer between the cover glaze and the polished glaze, the thickness is small, bubbles can be effectively prevented from rising, and the effect of protecting the ink jet layer and the glaze surface from generating air holes and concave glaze defects is achieved; the preparation method of the protective glaze suitable for firing in the low-temperature fast-firing kiln is simple in process and does not cause obvious increase of the manufacturing cost of the product.
本发明公开了一种适用于低温快烧窑烧制的保护釉及其陶瓷砖、制备方法，按照重量百分比计算，保护釉的原料的化学成分包括：SiO2、Al2O3、CaO、MgO、K2O、Na2O和烧失量；保护釉于低温快烧窑中烧成的温度为1199‑1230℃，烧成时间为50‑55min；保护釉的张力有效阻止面釉层、喷墨层和压制坯体中产生的气泡冲破釉层；本发明提出的低温快烧窑烧制的陶瓷砖，保护釉布施于面釉和抛釉之间的喷墨层的上方，厚度小，可有效阻止气泡上升，具有保护喷墨层和釉面不产生气孔和凹釉缺陷的效果；本发明提出的适用于低温快烧窑烧制的保护釉的制备方法，工艺简洁，不会导致产品的制造成本明显增加。
Protective glaze suitable for firing in low-temperature fast firing kiln, ceramic tile and preparation method thereof
The invention discloses a protective glaze suitable for firing in a low-temperature fast firing kiln and a ceramic tile and a preparation method thereof, and the protective glaze comprises the following chemical components of raw materials in percentage by weight: SiO2, Al2O3, CaO, MgO, K2O, Na2O and ignition loss; the firing temperature of the protective glaze in a low-temperature fast firing kiln is 1199-1230 DEG C, and the firing time is 50-55 minutes; the tension of the protective glaze effectively prevents bubbles generated in the cover glaze layer, the ink jet layer and the pressed green body from breaking through the glaze layer; according to the ceramic tile fired in the low-temperature fast firing kiln, the protective glaze is applied above the ink jet layer between the cover glaze and the polished glaze, the thickness is small, bubbles can be effectively prevented from rising, and the effect of protecting the ink jet layer and the glaze surface from generating air holes and concave glaze defects is achieved; the preparation method of the protective glaze suitable for firing in the low-temperature fast-firing kiln is simple in process and does not cause obvious increase of the manufacturing cost of the product.
本发明公开了一种适用于低温快烧窑烧制的保护釉及其陶瓷砖、制备方法，按照重量百分比计算，保护釉的原料的化学成分包括：SiO2、Al2O3、CaO、MgO、K2O、Na2O和烧失量；保护釉于低温快烧窑中烧成的温度为1199‑1230℃，烧成时间为50‑55min；保护釉的张力有效阻止面釉层、喷墨层和压制坯体中产生的气泡冲破釉层；本发明提出的低温快烧窑烧制的陶瓷砖，保护釉布施于面釉和抛釉之间的喷墨层的上方，厚度小，可有效阻止气泡上升，具有保护喷墨层和釉面不产生气孔和凹釉缺陷的效果；本发明提出的适用于低温快烧窑烧制的保护釉的制备方法，工艺简洁，不会导致产品的制造成本明显增加。
Protective glaze suitable for firing in low-temperature fast firing kiln, ceramic tile and preparation method thereof
适用于低温快烧窑烧制的保护釉及其陶瓷砖、制备方法
WANG QIUPING (Autor:in) / LI WEIQUAN (Autor:in) / JIANG NAN (Autor:in) / HUA WENWEI (Autor:in) / WU HECHENG (Autor:in) / LIU SHOUJIAN (Autor:in) / YANG WEIJIE (Autor:in) / ZHANG CHANGLU (Autor:in) / REN ZHONGJIE (Autor:in) / ZHU WENJUN (Autor:in)
20.05.2022
Patent
Elektronische Ressource
Chinesisch
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