Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Ceramic substrate-metal film product, preparation method thereof and electronic atomizer
The invention relates to a ceramic substrate-metal film product, a preparation method thereof and an electronic atomizer. In the preparation method of the product, a gas-phase metal precursor and the surface of a ceramic matrix are subjected to a first reaction mainly in an atomic deposition mode, and the first reaction comprises the step of enabling the gas-phase metal precursor to react with hydroxyl on the surface of the ceramic matrix, in this way, the gas-phase metal precursor can be adsorbed on the surface of the ceramic substrate in a chemical adsorption mode, then the reaction chamber is purged through the protective gas, and the gas-phase metal precursor and by-products which are not reacted in the first reaction are removed. And after the protective gas is purged, an oxygen source is introduced into the reaction chamber, the oxygen source and a product of the first reaction on the surface of the ceramic substrate are subjected to a second reaction, and then a metal film can be formed on the surface of the ceramic substrate. By means of the preparation method, the metal film with the nanoscale thickness can be formed on the surface of the ceramic substrate, and the thickness of the metal film and the material cost of the metal film are effectively reduced.
本申请涉及一种陶瓷基体‑金属薄膜制品及其制备方法和电子雾化器。在该制品的制备方法中，主要通过原子沉积的方式，使气相金属前驱体与陶瓷基体的表面进行第一反应，第一反应包括使气相金属前驱体与陶瓷基体表面的羟基进行的反应，这样可以使气相金属前驱体以化学吸附的方式吸附在陶瓷基体的表面，然后通过保护气体对反应室进行吹扫，除去第一反应中未反应的气相金属前驱体和副产物。保护气体吹扫之后，向反应室中通入氧源，使氧源与陶瓷基体表面的第一反应的产物进行第二反应，进而可以在陶瓷基体的表面形成金属薄膜。通过该制备方法可以在陶瓷基体的表面形成纳米级别厚度的金属薄膜，有效降低了金属膜的厚度和金属膜的材料成本。
Ceramic substrate-metal film product, preparation method thereof and electronic atomizer
The invention relates to a ceramic substrate-metal film product, a preparation method thereof and an electronic atomizer. In the preparation method of the product, a gas-phase metal precursor and the surface of a ceramic matrix are subjected to a first reaction mainly in an atomic deposition mode, and the first reaction comprises the step of enabling the gas-phase metal precursor to react with hydroxyl on the surface of the ceramic matrix, in this way, the gas-phase metal precursor can be adsorbed on the surface of the ceramic substrate in a chemical adsorption mode, then the reaction chamber is purged through the protective gas, and the gas-phase metal precursor and by-products which are not reacted in the first reaction are removed. And after the protective gas is purged, an oxygen source is introduced into the reaction chamber, the oxygen source and a product of the first reaction on the surface of the ceramic substrate are subjected to a second reaction, and then a metal film can be formed on the surface of the ceramic substrate. By means of the preparation method, the metal film with the nanoscale thickness can be formed on the surface of the ceramic substrate, and the thickness of the metal film and the material cost of the metal film are effectively reduced.
本申请涉及一种陶瓷基体‑金属薄膜制品及其制备方法和电子雾化器。在该制品的制备方法中，主要通过原子沉积的方式，使气相金属前驱体与陶瓷基体的表面进行第一反应，第一反应包括使气相金属前驱体与陶瓷基体表面的羟基进行的反应，这样可以使气相金属前驱体以化学吸附的方式吸附在陶瓷基体的表面，然后通过保护气体对反应室进行吹扫，除去第一反应中未反应的气相金属前驱体和副产物。保护气体吹扫之后，向反应室中通入氧源，使氧源与陶瓷基体表面的第一反应的产物进行第二反应，进而可以在陶瓷基体的表面形成金属薄膜。通过该制备方法可以在陶瓷基体的表面形成纳米级别厚度的金属薄膜，有效降低了金属膜的厚度和金属膜的材料成本。
Ceramic substrate-metal film product, preparation method thereof and electronic atomizer
陶瓷基体-金属薄膜制品及其制备方法和电子雾化器
ZANG JIADONG (Autor:in) / CHEN HE (Autor:in) / ZHAO BAIYANG (Autor:in)
09.05.2023
Patent
Elektronische Ressource
Chinesisch
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