Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Large sized sintered yttrium oxide body
Disclosed herein is a sintered yttrium oxide body having a total impurity level of 40 ppm or less, a density of not less than 4.93 g/cm3, where the sintered yttrium oxide body has at least one grain boundary comprising silica in an amount of not less than 1 atoms/nm2 to not more than 10 atoms/nm2, wherein the sintered yttrium oxide body has at least one surface comprising at least one void wherein no void has a diameter greater than 5 [mu] m. A method for manufacturing a sintered yttrium oxide body is also disclosed.
本文公开了一种烧结氧化钇体，该烧结氧化钇体具有40ppm或更低的总杂质水平、不小于4.93g/cm3的密度，其中该烧结氧化钇体具有至少一个晶界，该至少一个晶界包含量为不小于1个原子/nm2至不大于10个原子/nm2的二氧化硅，其中该烧结氧化钇体具有至少一个表面，该至少一个表面包括至少一个孔隙，其中没有孔隙的直径大于5μm。还公开了一种用于制造烧结氧化钇体的方法。
Large sized sintered yttrium oxide body
Disclosed herein is a sintered yttrium oxide body having a total impurity level of 40 ppm or less, a density of not less than 4.93 g/cm3, where the sintered yttrium oxide body has at least one grain boundary comprising silica in an amount of not less than 1 atoms/nm2 to not more than 10 atoms/nm2, wherein the sintered yttrium oxide body has at least one surface comprising at least one void wherein no void has a diameter greater than 5 [mu] m. A method for manufacturing a sintered yttrium oxide body is also disclosed.
本文公开了一种烧结氧化钇体，该烧结氧化钇体具有40ppm或更低的总杂质水平、不小于4.93g/cm3的密度，其中该烧结氧化钇体具有至少一个晶界，该至少一个晶界包含量为不小于1个原子/nm2至不大于10个原子/nm2的二氧化硅，其中该烧结氧化钇体具有至少一个表面，该至少一个表面包括至少一个孔隙，其中没有孔隙的直径大于5μm。还公开了一种用于制造烧结氧化钇体的方法。
Large sized sintered yttrium oxide body
大尺寸的烧结氧化钇体
M J DOLON (Autor:in) / THOMPSON LUCAS (Autor:in) / WALKER LARRY (Autor:in)
16.05.2023
Patent
Elektronische Ressource
Chinesisch
IPC:
C04B
Kalk
,
LIME
METHOD FOR MANUFACTURING LARGE SIZED CERAMICS SINTERED BODY
| Europäisches Patentamt | 2019
METHOD FOR MANUFACTURING LARGE SIZED CERAMICS SINTERED BODY
Europäisches Patentamt | 2019
Yttrium oxide-based sintered body and semiconductor production system member
| Europäisches Patentamt | 2024