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Yttrium oxide-zirconium oxide sintered ceramics for plasma resistant materials
Disclosed is a sintered ceramic body comprising yttrium oxide and zirconium oxide, in which the sintered ceramic body comprises not less than 75 mol% to not more than 95 mol% of yttrium oxide and not less than 5 mol% to not more than 25 mol% of zirconium oxide, in which the sintered ceramic body comprises a porosity in an amount of less than 2 vol%, wherein the change in the density of the ceramic sintered body over the maximum dimension relative to the theoretical density is not more than 2%. The ceramic sintered body has a grain size of from 0.4 to less than 2 [mu] m, as measured according to ASTM E112-2010. The ceramic sintered body may be machined into a plasma resistant component for use in a plasma processing chamber. The invention also discloses a preparation method.
本发明公开了一种陶瓷烧结体，该陶瓷烧结体包含氧化钇和氧化锆，其中该陶瓷烧结体包含不小于75摩尔％至不大于95摩尔％的氧化钇和不小于5摩尔％至不大于25摩尔％的氧化锆，其中该陶瓷烧结体包含小于2体积％的量的孔隙率，其中该陶瓷烧结体的密度在最大尺寸上相对于理论密度的变化不超过2％。该陶瓷烧结体具有0.4至小于2μm的晶粒尺寸，如根据ASTM E112‑2010所测量的。该陶瓷烧结体可机械加工成在等离子体加工室中使用的耐等离子体部件。还公开了制备方法。
Yttrium oxide-zirconium oxide sintered ceramics for plasma resistant materials
Disclosed is a sintered ceramic body comprising yttrium oxide and zirconium oxide, in which the sintered ceramic body comprises not less than 75 mol% to not more than 95 mol% of yttrium oxide and not less than 5 mol% to not more than 25 mol% of zirconium oxide, in which the sintered ceramic body comprises a porosity in an amount of less than 2 vol%, wherein the change in the density of the ceramic sintered body over the maximum dimension relative to the theoretical density is not more than 2%. The ceramic sintered body has a grain size of from 0.4 to less than 2 [mu] m, as measured according to ASTM E112-2010. The ceramic sintered body may be machined into a plasma resistant component for use in a plasma processing chamber. The invention also discloses a preparation method.
本发明公开了一种陶瓷烧结体，该陶瓷烧结体包含氧化钇和氧化锆，其中该陶瓷烧结体包含不小于75摩尔％至不大于95摩尔％的氧化钇和不小于5摩尔％至不大于25摩尔％的氧化锆，其中该陶瓷烧结体包含小于2体积％的量的孔隙率，其中该陶瓷烧结体的密度在最大尺寸上相对于理论密度的变化不超过2％。该陶瓷烧结体具有0.4至小于2μm的晶粒尺寸，如根据ASTM E112‑2010所测量的。该陶瓷烧结体可机械加工成在等离子体加工室中使用的耐等离子体部件。还公开了制备方法。
Yttrium oxide-zirconium oxide sintered ceramics for plasma resistant materials
用于耐等离子体性材料的氧化钇-氧化锆烧结陶瓷
WALKER LUKE (Autor:in) / DORON MICHAEL J (Autor:in)
23.01.2024
Patent
Elektronische Ressource
Chinesisch
| Europäisches Patentamt | 2024
| Europäisches Patentamt | 2023