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Silicon-containing high-entropy boride coating as well as preparation method and application thereof
The invention belongs to the technical field of high-entropy coatings, and particularly relates to a silicon-containing high-entropy boride coating and a preparation method and application thereof. In a silicon-containing high-entropy boride coating system provided by the invention, a metal oxide forms a framework, and Nb2O5 and Ta2O5 are used as main liquid phases to fill the framework to form a compact oxide layer; further, SiC is added, so that the coating performance and the oxidation and ablation resistance of the high-entropy boride can be effectively improved, and the coating performance and the oxidation and ablation resistance of the high-entropy boride can be effectively improved mainly due to the fact that SiO2 is generated after SiC is added, a compact oxidation layer can be formed, meanwhile, SiO2, borosilicate and o-ZrSiO4 are formed after SiC is added and can serve as liquid phases to fill holes, and the oxidation and ablation resistance of the high-entropy boride is improved. Wherein SiO2 also has a unique pinning effect. Therefore, the compactness of an oxide layer formed after SiC is added is better, and the oxidation ablation resistance of the material is improved.
本发明属于高熵涂层技术领域,具体涉及一种含硅高熵硼化物涂层及其制备方法和应用。本发明提供的含硅高熵硼化物涂层体系中,金属氧化物构成骨架,Nb2O5和Ta2O5作为主要液相填充骨架,构成致密氧化层;进一步的通过添加SiC,能够有效提高高熵硼化物的涂层性能以及抗氧化烧蚀性能,主要由于添加SiC后产生SiO2,能够构成致密的氧化层,同时与金属氧化物协同抗氧化,加入SiC后形成了SiO2、硼硅酸盐和o‑ZrSiO4,三者均能作为液相填充孔洞,其中SiO2还具有独特的钉扎作用。因此加入SiC后形成的氧化层致密性更好,从而提高材料的抗氧化烧蚀性能。
Silicon-containing high-entropy boride coating as well as preparation method and application thereof
The invention belongs to the technical field of high-entropy coatings, and particularly relates to a silicon-containing high-entropy boride coating and a preparation method and application thereof. In a silicon-containing high-entropy boride coating system provided by the invention, a metal oxide forms a framework, and Nb2O5 and Ta2O5 are used as main liquid phases to fill the framework to form a compact oxide layer; further, SiC is added, so that the coating performance and the oxidation and ablation resistance of the high-entropy boride can be effectively improved, and the coating performance and the oxidation and ablation resistance of the high-entropy boride can be effectively improved mainly due to the fact that SiO2 is generated after SiC is added, a compact oxidation layer can be formed, meanwhile, SiO2, borosilicate and o-ZrSiO4 are formed after SiC is added and can serve as liquid phases to fill holes, and the oxidation and ablation resistance of the high-entropy boride is improved. Wherein SiO2 also has a unique pinning effect. Therefore, the compactness of an oxide layer formed after SiC is added is better, and the oxidation ablation resistance of the material is improved.
本发明属于高熵涂层技术领域,具体涉及一种含硅高熵硼化物涂层及其制备方法和应用。本发明提供的含硅高熵硼化物涂层体系中,金属氧化物构成骨架,Nb2O5和Ta2O5作为主要液相填充骨架,构成致密氧化层;进一步的通过添加SiC,能够有效提高高熵硼化物的涂层性能以及抗氧化烧蚀性能,主要由于添加SiC后产生SiO2,能够构成致密的氧化层,同时与金属氧化物协同抗氧化,加入SiC后形成了SiO2、硼硅酸盐和o‑ZrSiO4,三者均能作为液相填充孔洞,其中SiO2还具有独特的钉扎作用。因此加入SiC后形成的氧化层致密性更好,从而提高材料的抗氧化烧蚀性能。
Silicon-containing high-entropy boride coating as well as preparation method and application thereof
一种含硅高熵硼化物涂层及其制备方法和应用
LIU YANBO (Autor:in) / CHI HUANYU (Autor:in) / MA ZHUANG (Autor:in) / LIU LING (Autor:in) / MOU GUANGYI (Autor:in) / HE SIYUAN (Autor:in) / LIU SHAOPU (Autor:in)
27.09.2024
Patent
Elektronische Ressource
Chinesisch
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