Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Preparation method of fluorine-doped tin oxide target material
The invention relates to the field of materials, in particular to a preparation method of a fluorine-doped tin oxide target material. Carrying out compression molding on the powder mixture of the raw materials and sintering; the powder mixture comprises the following components in percentage by weight: 70 to 99.9 percent of SnO2 and 0.1 to 10 percent of metal fluoride; 0 wt.% to 10 wt.% of a metal oxide; 0 wt.% to 10 wt.% of a sintering aid; the melting point of the metal fluoride is greater than 800 DEG C. According to the preparation method of the fluorine-doped tin oxide target material provided by the invention, a high-melting-point (gt; compared with the prior art, the metal fluoride with high temperature (800 DEG C) is used as a fluorine source of the fluorine-doped tin oxide target instead of stannous fluoride, so that the problem of decomposition of the metal fluoride in the high-temperature sintering process of the target is fundamentally solved, the control precision of the components of the target is improved, and the photoelectric property of the fluorine-doped tin oxide film can be effectively improved.
本申请涉及材料领域，具体而言，涉及一种掺氟氧化锡靶材的制备方法。将原料的粉体混合物压制成型后烧结；粉体混合物包括：70wt.％～99.9wt.％SnO2、0.1wt.％～10wt.％金属氟化物；0wt.％～10wt.％金属氧化物；0wt.％～10wt.％助烧剂；金属氟化物的熔点大于800℃。本申请提供的掺氟氧化锡靶材的制备方法，使用高熔点(>800℃)的金属氟化物替代氟化亚锡作为掺氟氧化锡靶材的氟源，从根本上解决了靶材高温烧结过程中金属氟化物分解的问题，从而提高了靶材成分的控制精度，进而能够有效地提升掺氟氧化锡薄膜的光电性能。
Preparation method of fluorine-doped tin oxide target material
The invention relates to the field of materials, in particular to a preparation method of a fluorine-doped tin oxide target material. Carrying out compression molding on the powder mixture of the raw materials and sintering; the powder mixture comprises the following components in percentage by weight: 70 to 99.9 percent of SnO2 and 0.1 to 10 percent of metal fluoride; 0 wt.% to 10 wt.% of a metal oxide; 0 wt.% to 10 wt.% of a sintering aid; the melting point of the metal fluoride is greater than 800 DEG C. According to the preparation method of the fluorine-doped tin oxide target material provided by the invention, a high-melting-point (gt; compared with the prior art, the metal fluoride with high temperature (800 DEG C) is used as a fluorine source of the fluorine-doped tin oxide target instead of stannous fluoride, so that the problem of decomposition of the metal fluoride in the high-temperature sintering process of the target is fundamentally solved, the control precision of the components of the target is improved, and the photoelectric property of the fluorine-doped tin oxide film can be effectively improved.
本申请涉及材料领域，具体而言，涉及一种掺氟氧化锡靶材的制备方法。将原料的粉体混合物压制成型后烧结；粉体混合物包括：70wt.％～99.9wt.％SnO2、0.1wt.％～10wt.％金属氟化物；0wt.％～10wt.％金属氧化物；0wt.％～10wt.％助烧剂；金属氟化物的熔点大于800℃。本申请提供的掺氟氧化锡靶材的制备方法，使用高熔点(>800℃)的金属氟化物替代氟化亚锡作为掺氟氧化锡靶材的氟源，从根本上解决了靶材高温烧结过程中金属氟化物分解的问题，从而提高了靶材成分的控制精度，进而能够有效地提升掺氟氧化锡薄膜的光电性能。
Preparation method of fluorine-doped tin oxide target material
掺氟氧化锡靶材的制备方法
CHEN XINGQIAN (Autor:in) / DU XIAOLONG (Autor:in) / LI HAOZHEN (Autor:in) / LIU YAOPING (Autor:in)
13.12.2024
Patent
Elektronische Ressource
Chinesisch
IPC:
C04B
Kalk
,
LIME
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