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A reactor designed for chemical vapor deposition method and method of producing elemental boron and advanced ceramic powders with this reactor
The invention relates to a reactor (1) designed for the chemical vapor deposition method employed in the production of elemental boron and advanced ceramic powders. The objective of the present invention is to provide a reactor design; which enables homogenous temperature distribution in the inner tube (2) where the reaction takes place thanks to its reflector (5), minimizes the energy losses occurring due to radiation; enables production of uniform, mono/multi-structured products in higher amounts compared to the conventional applications by means of the homogenous temperature distribution; and enables removal of the impurities in the product easily and completely; and to provide a production method for elemental boron and advanced ceramic powders by means of this reactor.
A reactor designed for chemical vapor deposition method and method of producing elemental boron and advanced ceramic powders with this reactor
The invention relates to a reactor (1) designed for the chemical vapor deposition method employed in the production of elemental boron and advanced ceramic powders. The objective of the present invention is to provide a reactor design; which enables homogenous temperature distribution in the inner tube (2) where the reaction takes place thanks to its reflector (5), minimizes the energy losses occurring due to radiation; enables production of uniform, mono/multi-structured products in higher amounts compared to the conventional applications by means of the homogenous temperature distribution; and enables removal of the impurities in the product easily and completely; and to provide a production method for elemental boron and advanced ceramic powders by means of this reactor.
A reactor designed for chemical vapor deposition method and method of producing elemental boron and advanced ceramic powders with this reactor
Für chemisches Dampfabscheidungsverfahren entworfener Reaktor und Verfahren zur Herstellung von elementarem Bor und erweiterter keramischer Pulver mit diesem Reaktor
Réacteur conçu pour procédé de dépôt chimique en phase vapeur, procédé de production de bore élémentaire et poudres céramiques avancées avec ce réacteur
DUMAN ISMAIL (Autor:in) / AGAOGULLARI DUYGU (Autor:in) / BALCI OZGE (Autor:in) / OVECOGLU LUFTI (Autor:in)
30.09.2020
Patent
Elektronische Ressource
Englisch
IPC:
C01B
NON-METALLIC ELEMENTS
,
Nichtmetallische Elemente
/
B01J
Chemische oder physikalische Verfahren, z.B. Katalyse oder Kolloidchemie
,
CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY
/
C04B
Kalk
,
LIME
/
C23C
Beschichten metallischer Werkstoffe
,
COATING METALLIC MATERIAL
/
F16L
PIPES
,
Rohre
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