Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
OXIDE SINTERED COMPACT, OXIDE SPUTTERING TARGET, AND OXIDE THIN FILM
A sintered compact essentially consisting of zinc (Zn), gallium (Ga), silicon (Si) and oxygen (O), wherein a Zn content expressed in terms of ZnO is 5 to 60 mol%, a Ga content expressed in terms of Ga 2 O 3 is 8.5 to 90 mol%, and a Si content expressed in terms of SiO 2 is 0 to 45 mol%, and the sintered compact satisfies a condition of A ¤ (B + 2C) when the Zn content expressed in terms of ZnO is A (mol%), the Ga content expressed in terms of Ga 2 O 3 is B (mol%), and the Si content expressed in terms of SiO 2 is C (mol%), and has a relative density of 90% or higher. An object of this invention is to efficiently obtain an amorphous film having high transmissivity and a low refractive index without having to introduce oxygen into the atmosphere during film deposition by DC sputtering.
OXIDE SINTERED COMPACT, OXIDE SPUTTERING TARGET, AND OXIDE THIN FILM
A sintered compact essentially consisting of zinc (Zn), gallium (Ga), silicon (Si) and oxygen (O), wherein a Zn content expressed in terms of ZnO is 5 to 60 mol%, a Ga content expressed in terms of Ga 2 O 3 is 8.5 to 90 mol%, and a Si content expressed in terms of SiO 2 is 0 to 45 mol%, and the sintered compact satisfies a condition of A ¤ (B + 2C) when the Zn content expressed in terms of ZnO is A (mol%), the Ga content expressed in terms of Ga 2 O 3 is B (mol%), and the Si content expressed in terms of SiO 2 is C (mol%), and has a relative density of 90% or higher. An object of this invention is to efficiently obtain an amorphous film having high transmissivity and a low refractive index without having to introduce oxygen into the atmosphere during film deposition by DC sputtering.
OXIDE SINTERED COMPACT, OXIDE SPUTTERING TARGET, AND OXIDE THIN FILM
GESINTERTES OXIDKOMPAKTTEIL, OXID-SPUTTERTARGET UND OXIDDÜNNSCHICHT
COMPRIMÉ FRITTÉ D'OXYDE, CIBLE DE PULVÉRISATION CATHODIQUE D'OXYDE ET FILM MINCE D'OXYDE
NARA ATSUSHI (Autor:in) / SEKI HIDETO (Autor:in)
01.05.2019
Patent
Elektronische Ressource
Englisch
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