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MAGNESIUM OXIDE SPUTTERING TARGET
A sputtering target configured from a magnesium oxide sintered body, wherein a ratio of crystal grains of the magnesium oxide sintered body in which a number of pinholes in a single crystal grain is 20 or more is 50% or less. The present invention is a sputtering target configured from a magnesium oxide sintered body in which the generation of particles during sputtering is less.
MAGNESIUM OXIDE SPUTTERING TARGET
A sputtering target configured from a magnesium oxide sintered body, wherein a ratio of crystal grains of the magnesium oxide sintered body in which a number of pinholes in a single crystal grain is 20 or more is 50% or less. The present invention is a sputtering target configured from a magnesium oxide sintered body in which the generation of particles during sputtering is less.
MAGNESIUM OXIDE SPUTTERING TARGET
MAGNESIUMOXIDSPUTTERTARGET
CIBLE DE PULVÉRISATION D'OXYDE DE MAGNÉSIUM
KAJITA HIROKI (Autor:in) / SHIBUYA YOSHITAKA (Autor:in) / NARITA SATOYASU (Autor:in)
25.05.2022
Patent
Elektronische Ressource
Englisch
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