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MAGNESIUM OXIDE SPUTTERING TARGET AND METHOD OF MAKING SAME
A sintered compact magnesium oxide target for sputtering having a purity of 99.99 wt % or higher, a density of 3.58 g/cm3 or higher, and a transparency 10% or more. A sintered compact magnesium oxide target for sputtering having a purity of 99.99 wt % or higher, a density of 3.58 g/cm3 or higher, and an average crystal grain size of 50 μm or more.
MAGNESIUM OXIDE SPUTTERING TARGET AND METHOD OF MAKING SAME
A sintered compact magnesium oxide target for sputtering having a purity of 99.99 wt % or higher, a density of 3.58 g/cm3 or higher, and a transparency 10% or more. A sintered compact magnesium oxide target for sputtering having a purity of 99.99 wt % or higher, a density of 3.58 g/cm3 or higher, and an average crystal grain size of 50 μm or more.
MAGNESIUM OXIDE SPUTTERING TARGET AND METHOD OF MAKING SAME
IVANOV EUGENE Y (Autor:in) / JAWORSKI CHRISTOPHER M (Autor:in)
09.01.2020
Patent
Elektronische Ressource
Englisch
MAGNESIUM OXIDE SPUTTERING TARGET AND METHOD OF MAKING SAME
Europäisches Patentamt | 2018
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