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OXIDE SINTERED COMPACT, PRODUCTION METHOD OF THE SAME, AND SPUTTERING TARGET USING THE OXIDE SINTERED COMPACT
PROBLEM TO BE SOLVED: To provide an oxide sintered compact which has little variation of the contraction coefficient and the density between before and after sintering, and on which defects such as a warp, a crack or the like scarcely exist, and to provide a production method thereof.SOLUTION: In a production method of an oxide sintered compact, a molded body 1 formed by pressure-molding raw material powder including a metal oxide is obtained, and a sintered compact is obtained by sintering the molded body in a state in which a shield 3 is arranged between the molded body and a heater 2 in a sintering furnace. The shield 3 is configured, excluding corners, by combining a plurality of shield pieces 4 provided with engagement parts on the ends in the length direction such that the engagement parts of the shield pieces 4 are opposing each other, and gaps 9 with widths of 1-5 mm are formed between the mutually opposing engagement parts in a shape nonlinear with respect to the thickness direction. A sputtering target is also disclosed.SELECTED DRAWING: Figure 1
【課題】焼結前後における収縮率や密度のばらつきが少なく、かつ、反りやクラック等の欠陥がほとんど存在しない、酸化物焼結体及びその製造方法の提供。【解決手段】金属酸化物を含む原料粉末を加圧成形した成形体1を得て、該成形体を焼結炉内のヒータ2との間に遮蔽物3が配置された状態で焼結させて、焼結体を得、遮蔽物3を、長さ方向端部に係合部を備えた複数の遮蔽片4を、角部を除き、遮蔽片4の係合部同士が相対し、かつ、相対する係合部の間に、厚さ方向に関して非直線状で、幅1〜5mmの間隙9が形成されるように構成する金属酸化物であり、スパッタリングターゲット材。【選択図】図1
OXIDE SINTERED COMPACT, PRODUCTION METHOD OF THE SAME, AND SPUTTERING TARGET USING THE OXIDE SINTERED COMPACT
PROBLEM TO BE SOLVED: To provide an oxide sintered compact which has little variation of the contraction coefficient and the density between before and after sintering, and on which defects such as a warp, a crack or the like scarcely exist, and to provide a production method thereof.SOLUTION: In a production method of an oxide sintered compact, a molded body 1 formed by pressure-molding raw material powder including a metal oxide is obtained, and a sintered compact is obtained by sintering the molded body in a state in which a shield 3 is arranged between the molded body and a heater 2 in a sintering furnace. The shield 3 is configured, excluding corners, by combining a plurality of shield pieces 4 provided with engagement parts on the ends in the length direction such that the engagement parts of the shield pieces 4 are opposing each other, and gaps 9 with widths of 1-5 mm are formed between the mutually opposing engagement parts in a shape nonlinear with respect to the thickness direction. A sputtering target is also disclosed.SELECTED DRAWING: Figure 1
【課題】焼結前後における収縮率や密度のばらつきが少なく、かつ、反りやクラック等の欠陥がほとんど存在しない、酸化物焼結体及びその製造方法の提供。【解決手段】金属酸化物を含む原料粉末を加圧成形した成形体1を得て、該成形体を焼結炉内のヒータ2との間に遮蔽物3が配置された状態で焼結させて、焼結体を得、遮蔽物3を、長さ方向端部に係合部を備えた複数の遮蔽片4を、角部を除き、遮蔽片4の係合部同士が相対し、かつ、相対する係合部の間に、厚さ方向に関して非直線状で、幅1〜5mmの間隙9が形成されるように構成する金属酸化物であり、スパッタリングターゲット材。【選択図】図1
OXIDE SINTERED COMPACT, PRODUCTION METHOD OF THE SAME, AND SPUTTERING TARGET USING THE OXIDE SINTERED COMPACT
酸化物焼結体とその製造方法、および、この酸化物焼結体を用いたスパッタリングターゲット
ARIIZUMI HIDEYUKI (Autor:in)
10.03.2016
Patent
Elektronische Ressource
Japanisch
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