Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
SUBSTRATE HOLDING MEMBER AND MANUFACTURING METHOD THEREOF
To provide a substrate holding member and a manufacturing method thereof by which adhesion between a substrate and a DLC film is improved.SOLUTION: A substrate 1 made of a ceramic dense body is manufactured. A coating 2 made of a DLC film constituting a contact portion of a substrate holding member with respect to a substrate W is formed by ionization vapor deposition so as to at least partially cover the substrate 1. The peeling load of the film 2 from the substrate 1 is 300 mN or more.SELECTED DRAWING: Figure 1
【課題】基材およびＤＬＣ膜の密着性の向上が図られた基板保持部材およびその製造方法を提供する。【解決手段】セラミックス緻密質体からなる基材１が作製される。基材１を少なくとも部分的に被覆するように、イオン化蒸着法により、基板保持部材の基板Ｗに対する接触箇所を構成するＤＬＣ膜からなる被膜２が形成される。被膜２の基材１からの剥離荷重が３００ｍＮ以上である。【選択図】図１
SUBSTRATE HOLDING MEMBER AND MANUFACTURING METHOD THEREOF
To provide a substrate holding member and a manufacturing method thereof by which adhesion between a substrate and a DLC film is improved.SOLUTION: A substrate 1 made of a ceramic dense body is manufactured. A coating 2 made of a DLC film constituting a contact portion of a substrate holding member with respect to a substrate W is formed by ionization vapor deposition so as to at least partially cover the substrate 1. The peeling load of the film 2 from the substrate 1 is 300 mN or more.SELECTED DRAWING: Figure 1
【課題】基材およびＤＬＣ膜の密着性の向上が図られた基板保持部材およびその製造方法を提供する。【解決手段】セラミックス緻密質体からなる基材１が作製される。基材１を少なくとも部分的に被覆するように、イオン化蒸着法により、基板保持部材の基板Ｗに対する接触箇所を構成するＤＬＣ膜からなる被膜２が形成される。被膜２の基材１からの剥離荷重が３００ｍＮ以上である。【選択図】図１
SUBSTRATE HOLDING MEMBER AND MANUFACTURING METHOD THEREOF
基板保持部材およびその製造方法
TEJIMA TAKASHI (Autor:in)
27.12.2018
Patent
Elektronische Ressource
Japanisch
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