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    MOLYBDENUM OXIDE SINTERED BODY SPUTTERING TARGET AND OXIDE THIN FILM

    Neue Suche nach: HWANG BYUNGJIN
    Neue Suche nach: LEE SEUNGYI
    Neue Suche nach: LEE HYOWON
    Neue Suche nach: JANG BONGJUNG
    Neue Suche nach: JEON BONGJUN
    Neue Suche nach: JIN SEUNGHYEON
    Neue Suche nach: PARK JAESOUNG
    Neue Suche nach: YANG SEUNGHO

    The present invention provides an oxide sintered body including molybdenum oxide as a main component, a sputtering target including the sintered body, and an oxide thin film formed therefrom. In the present invention, by adding a specific (semi-)metal oxide to a difficult-to-sinter molybdenum oxide and a niobium oxide in a predetermined range, it is possible to simultaneously improve sinterability and secure high-density characteristics even when non-pressurized sintering is performed.

    본 발명은 몰리브덴 산화물을 주(主)성분으로 하는 산화물 소결체, 상기 소결체를 포함하는 스퍼터링 타겟 및 이로부터 형성된 산화물 박막을 제공한다. 본 발명에서는 난(難)소결성 몰리브덴 산화물과 니오븀 산화물에 특정 (준)금속산화물을 소정 범위로 첨가함으로써, 무가압 소결을 실시하더라도 소결성 개선과 고밀도 특성을 동시에 확보할 수 있다.

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    MOLYBDENUM OXIDE SINTERED BODY SPUTTERING TARGET AND OXIDE THIN FILM

    Neue Suche nach: HWANG BYUNGJIN
    Neue Suche nach: LEE SEUNGYI
    Neue Suche nach: LEE HYOWON
    Neue Suche nach: JANG BONGJUNG
    Neue Suche nach: JEON BONGJUN
    Neue Suche nach: JIN SEUNGHYEON
    Neue Suche nach: PARK JAESOUNG
    Neue Suche nach: YANG SEUNGHO

    The present invention provides an oxide sintered body including molybdenum oxide as a main component, a sputtering target including the sintered body, and an oxide thin film formed therefrom. In the present invention, by adding a specific (semi-)metal oxide to a difficult-to-sinter molybdenum oxide and a niobium oxide in a predetermined range, it is possible to simultaneously improve sinterability and secure high-density characteristics even when non-pressurized sintering is performed.

    본 발명은 몰리브덴 산화물을 주(主)성분으로 하는 산화물 소결체, 상기 소결체를 포함하는 스퍼터링 타겟 및 이로부터 형성된 산화물 박막을 제공한다. 본 발명에서는 난(難)소결성 몰리브덴 산화물과 니오븀 산화물에 특정 (준)금속산화물을 소정 범위로 첨가함으로써, 무가압 소결을 실시하더라도 소결성 개선과 고밀도 특성을 동시에 확보할 수 있다.

    Zugriff

    Download

    MOLYBDENUM OXIDE SINTERED BODY SPUTTERING TARGET AND OXIDE THIN FILM

    Neue Suche nach: HWANG BYUNGJIN
    Neue Suche nach: LEE SEUNGYI
    Neue Suche nach: LEE HYOWON
    Neue Suche nach: JANG BONGJUNG
    Neue Suche nach: JEON BONGJUN
    Neue Suche nach: JIN SEUNGHYEON
    Neue Suche nach: PARK JAESOUNG
    Neue Suche nach: YANG SEUNGHO

    The present invention provides an oxide sintered body including molybdenum oxide as a main component, a sputtering target including the sintered body, and an oxide thin film formed therefrom. In the present invention, by adding a specific (semi-)metal oxide to a difficult-to-sinter molybdenum oxide and a niobium oxide in a predetermined range, it is possible to simultaneously improve sinterability and secure high-density characteristics even when non-pressurized sintering is performed.

    본 발명은 몰리브덴 산화물을 주(主)성분으로 하는 산화물 소결체, 상기 소결체를 포함하는 스퍼터링 타겟 및 이로부터 형성된 산화물 박막을 제공한다. 본 발명에서는 난(難)소결성 몰리브덴 산화물과 니오븀 산화물에 특정 (준)금속산화물을 소정 범위로 첨가함으로써, 무가압 소결을 실시하더라도 소결성 개선과 고밀도 특성을 동시에 확보할 수 있다.

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    Titel:

    MOLYBDENUM OXIDE SINTERED BODY SPUTTERING TARGET AND OXIDE THIN FILM

    Weitere Titelangaben:

    몰리브덴 산화물계 소결체, 이를 포함하는 스퍼터링 타겟 및 산화물 박막

    Beteiligte:

    HWANG BYUNGJIN (Autor:in) / LEE SEUNGYI (Autor:in) / LEE HYOWON (Autor:in) / JANG BONGJUNG (Autor:in) / JEON BONGJUN (Autor:in) / JIN SEUNGHYEON (Autor:in) / PARK JAESOUNG (Autor:in) / YANG SEUNGHO (Autor:in)

    Erscheinungsdatum:

    24.04.2023

    Medientyp:

    Patent

    Format:

    Elektronische Ressource

    Sprache:

    Koreanisch

    Klassifikation:

    IPC:  C04B Kalk , LIME / C23C Beschichten metallischer Werkstoffe , COATING METALLIC MATERIAL / H01L Halbleiterbauelemente , SEMICONDUCTOR DEVICES / H10K

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