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Polycrystalline dielectric thin film and capacitance element
A polycrystalline dielectric thin film including a main component made of an oxynitride expressed by a general formula of (M(1)1-xM(2)x)(M(3)1-yM(4)y)(O1-zNz)3. 0≤x≤1, 0≤y≤1, and 0
Polycrystalline dielectric thin film and capacitance element
A polycrystalline dielectric thin film including a main component made of an oxynitride expressed by a general formula of (M(1)1-xM(2)x)(M(3)1-yM(4)y)(O1-zNz)3. 0≤x≤1, 0≤y≤1, and 0
Polycrystalline dielectric thin film and capacitance element
UMEDA YUJI (Autor:in) / YAMAZAKI KUMIKO (Autor:in)
31.12.2019
Patent
Elektronische Ressource
Englisch
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