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Target material for deposition of molybdenum oxide layers
An electrically conductive, oxidic target material includes a proportion of substoichiometric molybdenum oxide phases of at least 60% by volume, an MoO2 phase in a proportion of 2-20% by volume, and optionally an MoO3 phase in a proportion of 0-20% by volume. The substoichiometric molybdenum oxide phase proportion is formed by one or more substoichiometric MoO3-y phase(s), where y is in each case in a range from 0.05 to 0.25. A process for producing the target material and a process for using the target material are also provided.
Target material for deposition of molybdenum oxide layers
An electrically conductive, oxidic target material includes a proportion of substoichiometric molybdenum oxide phases of at least 60% by volume, an MoO2 phase in a proportion of 2-20% by volume, and optionally an MoO3 phase in a proportion of 0-20% by volume. The substoichiometric molybdenum oxide phase proportion is formed by one or more substoichiometric MoO3-y phase(s), where y is in each case in a range from 0.05 to 0.25. A process for producing the target material and a process for using the target material are also provided.
Target material for deposition of molybdenum oxide layers
FRANZKE ENRICO (Autor:in) / KOESTENBAUER HARALD (Autor:in) / WINKLER JOERG (Autor:in) / LORENZ DOMINIK (Autor:in) / LEITER THOMAS (Autor:in)
02.01.2024
Patent
Elektronische Ressource
Englisch
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