A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
MAGNESIUM OXIDE SPUTTERING TARGET AND METHOD OF MAKING SAME
A sintered compact magnesium oxide target for sputtering having a purity of 99.99 wt % or higher, a density of 3.58 g/cm3 or higher, and a transparency 10% or more. A sintered compact magnesium oxide target for sputtering having a purity of 99.99 wt % or higher, a density of 3.58 g/cm3 or higher, and an average crystal grain size of 50 μm or more.
MAGNESIUM OXIDE SPUTTERING TARGET AND METHOD OF MAKING SAME
A sintered compact magnesium oxide target for sputtering having a purity of 99.99 wt % or higher, a density of 3.58 g/cm3 or higher, and a transparency 10% or more. A sintered compact magnesium oxide target for sputtering having a purity of 99.99 wt % or higher, a density of 3.58 g/cm3 or higher, and an average crystal grain size of 50 μm or more.
MAGNESIUM OXIDE SPUTTERING TARGET AND METHOD OF MAKING SAME
IVANOV EUGENE Y (author) / JAWORSKI CHRISTOPHER M (author)
2020-01-09
Patent
Electronic Resource
English
MAGNESIUM OXIDE SPUTTERING TARGET AND METHOD OF MAKING SAME
| European Patent Office | 2018