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    MEMBER FOR PLASMA PROCESSING APPARATUS, PLASMA PROCESSING APPARATUS WITH THE SAME AND METHOD FOR USING SINTERED BODY

    Neue Suche nach: IKEDA TAKASHI
    Neue Suche nach: ISHII HAJIME
    Neue Suche nach: FUJIMOTO KENJI
    Neue Suche nach: SATOH NAOYUKI
    Neue Suche nach: NAGAYAMA NOBUYUKI
    Neue Suche nach: MURAKAMI KOICHI
    Neue Suche nach: MURAKAMI TAKAHIRO

    Provided is a member for a plasma processing apparatus consisting of a tungsten carbide phase. The member includes at least one type of atom selected from the group consisting of a Fe atom, a Co atom, and a Ni atom, in which the total content of the atoms is in a range of 30 to 3300 atomic ppm.

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    MEMBER FOR PLASMA PROCESSING APPARATUS, PLASMA PROCESSING APPARATUS WITH THE SAME AND METHOD FOR USING SINTERED BODY

    Neue Suche nach: IKEDA TAKASHI
    Neue Suche nach: ISHII HAJIME
    Neue Suche nach: FUJIMOTO KENJI
    Neue Suche nach: SATOH NAOYUKI
    Neue Suche nach: NAGAYAMA NOBUYUKI
    Neue Suche nach: MURAKAMI KOICHI
    Neue Suche nach: MURAKAMI TAKAHIRO

    Provided is a member for a plasma processing apparatus consisting of a tungsten carbide phase. The member includes at least one type of atom selected from the group consisting of a Fe atom, a Co atom, and a Ni atom, in which the total content of the atoms is in a range of 30 to 3300 atomic ppm.

    Zugriff

    Download

    MEMBER FOR PLASMA PROCESSING APPARATUS, PLASMA PROCESSING APPARATUS WITH THE SAME AND METHOD FOR USING SINTERED BODY

    Neue Suche nach: IKEDA TAKASHI
    Neue Suche nach: ISHII HAJIME
    Neue Suche nach: FUJIMOTO KENJI
    Neue Suche nach: SATOH NAOYUKI
    Neue Suche nach: NAGAYAMA NOBUYUKI
    Neue Suche nach: MURAKAMI KOICHI
    Neue Suche nach: MURAKAMI TAKAHIRO

    Provided is a member for a plasma processing apparatus consisting of a tungsten carbide phase. The member includes at least one type of atom selected from the group consisting of a Fe atom, a Co atom, and a Ni atom, in which the total content of the atoms is in a range of 30 to 3300 atomic ppm.

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    Download

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    Ähnliche Titel

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    Titel:

    MEMBER FOR PLASMA PROCESSING APPARATUS, PLASMA PROCESSING APPARATUS WITH THE SAME AND METHOD FOR USING SINTERED BODY

    Beteiligte:

    IKEDA TAKASHI (Autor:in) / ISHII HAJIME (Autor:in) / FUJIMOTO KENJI (Autor:in) / SATOH NAOYUKI (Autor:in) / NAGAYAMA NOBUYUKI (Autor:in) / MURAKAMI KOICHI (Autor:in) / MURAKAMI TAKAHIRO (Autor:in)

    Erscheinungsdatum:

    08.10.2020

    Medientyp:

    Patent

    Format:

    Elektronische Ressource

    Sprache:

    Englisch

    Klassifikation:

    IPC:  C04B Kalk , LIME / C23F Nichtmechanisches Entfernen metallischer Stoffe von Oberflächen , NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES / H01L Halbleiterbauelemente , SEMICONDUCTOR DEVICES

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