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Member for plasma processing apparatus and plasma processing apparatus with the same
Provided is a member for a plasma processing apparatus consisting of a tungsten carbide phase. The member includes at least one type of atom selected from the group consisting of a Fe atom, a Co atom, and a Ni atom, in which the total content of the atoms is in a range of 30 to 3300 atomic ppm.
Member for plasma processing apparatus and plasma processing apparatus with the same
Provided is a member for a plasma processing apparatus consisting of a tungsten carbide phase. The member includes at least one type of atom selected from the group consisting of a Fe atom, a Co atom, and a Ni atom, in which the total content of the atoms is in a range of 30 to 3300 atomic ppm.
Member for plasma processing apparatus and plasma processing apparatus with the same
IKEDA TAKASHI (Autor:in) / ISHII HAJIME (Autor:in) / FUJIMOTO KENJI (Autor:in) / SATOH NAOYUKI (Autor:in) / NAGAYAMA NOBUYUKI (Autor:in) / MURAKAMI KOICHI (Autor:in) / MURAKAMI TAKAHIRO (Autor:in)
10.01.2023
Patent
Elektronische Ressource
Englisch
IPC:
C04B
Kalk
,
LIME
/
C23F
Nichtmechanisches Entfernen metallischer Stoffe von Oberflächen
,
NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES
/
H01J
Elektrische Entladungsröhren oder Entladungslampen
,
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
/
H01L
Halbleiterbauelemente
,
SEMICONDUCTOR DEVICES
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