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    MEMBER FOR PLASMA PROCESSING APPARATUS, PLASMA PROCESSING APPARATUS WITH THE SAME AND METHOD FOR USING SINTERED BODY

    New search for: IKEDA TAKASHI
    New search for: ISHII HAJIME
    New search for: FUJIMOTO KENJI
    New search for: SATOH NAOYUKI
    New search for: NAGAYAMA NOBUYUKI
    New search for: MURAKAMI KOICHI
    New search for: MURAKAMI TAKAHIRO

    Provided is a member for a plasma processing apparatus consisting of a tungsten carbide phase. The member includes at least one type of atom selected from the group consisting of a Fe atom, a Co atom, and a Ni atom, in which the total content of the atoms is in a range of 30 to 3300 atomic ppm.

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    MEMBER FOR PLASMA PROCESSING APPARATUS, PLASMA PROCESSING APPARATUS WITH THE SAME AND METHOD FOR USING SINTERED BODY

    New search for: IKEDA TAKASHI
    New search for: ISHII HAJIME
    New search for: FUJIMOTO KENJI
    New search for: SATOH NAOYUKI
    New search for: NAGAYAMA NOBUYUKI
    New search for: MURAKAMI KOICHI
    New search for: MURAKAMI TAKAHIRO

    Provided is a member for a plasma processing apparatus consisting of a tungsten carbide phase. The member includes at least one type of atom selected from the group consisting of a Fe atom, a Co atom, and a Ni atom, in which the total content of the atoms is in a range of 30 to 3300 atomic ppm.

    Access

    Download

    MEMBER FOR PLASMA PROCESSING APPARATUS, PLASMA PROCESSING APPARATUS WITH THE SAME AND METHOD FOR USING SINTERED BODY

    New search for: IKEDA TAKASHI
    New search for: ISHII HAJIME
    New search for: FUJIMOTO KENJI
    New search for: SATOH NAOYUKI
    New search for: NAGAYAMA NOBUYUKI
    New search for: MURAKAMI KOICHI
    New search for: MURAKAMI TAKAHIRO

    Provided is a member for a plasma processing apparatus consisting of a tungsten carbide phase. The member includes at least one type of atom selected from the group consisting of a Fe atom, a Co atom, and a Ni atom, in which the total content of the atoms is in a range of 30 to 3300 atomic ppm.

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    Download

    Access

    Download

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    Document information
    Similar titles

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    Document information
    Title:

    MEMBER FOR PLASMA PROCESSING APPARATUS, PLASMA PROCESSING APPARATUS WITH THE SAME AND METHOD FOR USING SINTERED BODY

    Contributors:

    IKEDA TAKASHI (author) / ISHII HAJIME (author) / FUJIMOTO KENJI (author) / SATOH NAOYUKI (author) / NAGAYAMA NOBUYUKI (author) / MURAKAMI KOICHI (author) / MURAKAMI TAKAHIRO (author)

    Publication date:

    2020-10-08

    Type of media:

    Patent

    Type of material:

    Electronic Resource

    Language:

    English

    Classification:

    IPC:  C04B Kalk , LIME / C23F Nichtmechanisches Entfernen metallischer Stoffe von Oberflächen , NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES / H01L Halbleiterbauelemente , SEMICONDUCTOR DEVICES

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