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GAS PLUG, ELECTROSTATIC ATTRACTION MEMBER, AND PLASMA TREATMENT DEVICE
A gas plug of the present disclosure is composed of a columnar porous composite in which a plurality of silicon compound phases containing silicon carbide as a main component are connected to each other via a silicon phase having silicon as a main component. The porous composite is housed inside a tubular body made from a dense ceramic.
GAS PLUG, ELECTROSTATIC ATTRACTION MEMBER, AND PLASMA TREATMENT DEVICE
A gas plug of the present disclosure is composed of a columnar porous composite in which a plurality of silicon compound phases containing silicon carbide as a main component are connected to each other via a silicon phase having silicon as a main component. The porous composite is housed inside a tubular body made from a dense ceramic.
GAS PLUG, ELECTROSTATIC ATTRACTION MEMBER, AND PLASMA TREATMENT DEVICE
KAWASE YUUJI (Autor:in) / NOGUCHI YUKIO (Autor:in)
09.06.2022
Patent
Elektronische Ressource
Englisch
GAS PLUG, MEMBER FOR ELECTROSTATIC SUCTION AND PLASMA PROCESSING APPARATUS
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