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PLASMA RESISTANT MEMBER, PLASMA TREATMENT DEVICE COMPONENT, AND PLASMA TREATMENT DEVICE
The present disclosure relates to a plasma resistant member in which a surface exposed to plasma is formed from a single crystal yttrium⋅aluminum⋅garnet (YAG) having a {100} plane, and a plasma treatment device component and a plasma treatment device using the plasma resistant member. When there are a plurality of surfaces exposed to plasma, at least a surface required to have the highest plasma resistance is formed from the single crystal YAG having a {100} plane.
PLASMA RESISTANT MEMBER, PLASMA TREATMENT DEVICE COMPONENT, AND PLASMA TREATMENT DEVICE
The present disclosure relates to a plasma resistant member in which a surface exposed to plasma is formed from a single crystal yttrium⋅aluminum⋅garnet (YAG) having a {100} plane, and a plasma treatment device component and a plasma treatment device using the plasma resistant member. When there are a plurality of surfaces exposed to plasma, at least a surface required to have the highest plasma resistance is formed from the single crystal YAG having a {100} plane.
PLASMA RESISTANT MEMBER, PLASMA TREATMENT DEVICE COMPONENT, AND PLASMA TREATMENT DEVICE
YAMASHIRO MAMORU (Autor:in) / KUBO YOSHINORI (Autor:in) / YUKIHIRO KEIJI (Autor:in)
19.01.2023
Patent
Elektronische Ressource
Englisch
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