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Deposition Of Piezoelectric Films
A piezoelectric device comprises: a substrate (12) and a lead magnesium niobate-lead titanate (PMNPT) piezoelectric film on the substrate (12). The PMNPT film comprises: a thermal oxide layer (20) on the substrate (12); a first electrode above on the thermal oxide layer (20); a seed layer (26) above the first electrode; a lead magnesium niobate-lead titanate (PMNPT) piezoelectric layer (16) on the seed layer (26), and a second electrode on the PMNPT piezoelectric layer (16). The PMNPT film comprises a piezoelectric coefficient (d33) of greater than or equal to 200 pm/V.
Deposition Of Piezoelectric Films
A piezoelectric device comprises: a substrate (12) and a lead magnesium niobate-lead titanate (PMNPT) piezoelectric film on the substrate (12). The PMNPT film comprises: a thermal oxide layer (20) on the substrate (12); a first electrode above on the thermal oxide layer (20); a seed layer (26) above the first electrode; a lead magnesium niobate-lead titanate (PMNPT) piezoelectric layer (16) on the seed layer (26), and a second electrode on the PMNPT piezoelectric layer (16). The PMNPT film comprises a piezoelectric coefficient (d33) of greater than or equal to 200 pm/V.
Deposition Of Piezoelectric Films
SHARMA VIJAY BHAN (Autor:in) / XUE YUAN (Autor:in) / SANGLE ABHIJEET LAXMAN (Autor:in) / RAMAKRISHNAN BHARATWAJ (Autor:in) / YANG YI (Autor:in) / SETH SURESH CHAND (Autor:in) / KADAM ANKUR ANANT (Autor:in)
04.04.2024
Patent
Elektronische Ressource
Englisch
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