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Oxide sintered compact and sputtering target
This oxide sintered compact is obtained by mixing and sintering powders of zinc oxide, tin oxide and indium oxide. As determined by X-ray diffractometry of this oxide sintered compact, the oxide sintered compact has a Zn2SnO4 phase as the main phase and contains an In/In2O3—ZnSnO3 solid solution wherein In and/or In2O3 is solid-solved in ZnSnO3, but a ZnxInyOz phase (wherein x, y and z each represents an arbitrary positive integer) is not detected. Consequently, the present invention was able to provide an oxide sintered compact which is suitable for use in the production of an oxide semiconductor film for display devices and has both high electrical conductivity and high relative density. The oxide sintered compact is capable of forming an oxide semiconductor film that has high carrier mobility.
Oxide sintered compact and sputtering target
This oxide sintered compact is obtained by mixing and sintering powders of zinc oxide, tin oxide and indium oxide. As determined by X-ray diffractometry of this oxide sintered compact, the oxide sintered compact has a Zn2SnO4 phase as the main phase and contains an In/In2O3—ZnSnO3 solid solution wherein In and/or In2O3 is solid-solved in ZnSnO3, but a ZnxInyOz phase (wherein x, y and z each represents an arbitrary positive integer) is not detected. Consequently, the present invention was able to provide an oxide sintered compact which is suitable for use in the production of an oxide semiconductor film for display devices and has both high electrical conductivity and high relative density. The oxide sintered compact is capable of forming an oxide semiconductor film that has high carrier mobility.
Oxide sintered compact and sputtering target
GOTO HIROSHI (Autor:in) / IWASAKI YUKI (Autor:in) / EHIRA MASAYA (Autor:in) / YONEDA YOICHIRO (Autor:in)
16.06.2015
Patent
Elektronische Ressource
Englisch
OXIDE SINTERED COMPACT AND SPUTTERING TARGET FORMED FROM SAID OXIDE SINTERED COMPACT
Europäisches Patentamt | 2018
|Oxide sintered compact and sputtering target formed from said oxide sintered compact
Europäisches Patentamt | 2018
|Oxide sintered compact and sputtering target formed from said oxide sintered compact
Europäisches Patentamt | 2018
|