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    Oxide sintered compact and sputtering target formed from said oxide sintered compact

    Neue Suche nach: YAMAGUCHI YOHEI
    Neue Suche nach: KAKUTA KOJI

    An IGZO sintered compact composed of indium (In), gallium (Ga), zinc (Zn), oxygen (O) and unavoidable impurities, wherein an average length of cracks existing in the IGZO sintered compact is 3 μm or more and 15 μm or less. Provided is a sputtering target capable of suppressing the target cracks and reducing the generation of particles during deposition via DC sputtering, and forming favorable thin films.

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    Oxide sintered compact and sputtering target formed from said oxide sintered compact

    Neue Suche nach: YAMAGUCHI YOHEI
    Neue Suche nach: KAKUTA KOJI

    An IGZO sintered compact composed of indium (In), gallium (Ga), zinc (Zn), oxygen (O) and unavoidable impurities, wherein an average length of cracks existing in the IGZO sintered compact is 3 μm or more and 15 μm or less. Provided is a sputtering target capable of suppressing the target cracks and reducing the generation of particles during deposition via DC sputtering, and forming favorable thin films.

    Zugriff

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    Oxide sintered compact and sputtering target formed from said oxide sintered compact

    Neue Suche nach: YAMAGUCHI YOHEI
    Neue Suche nach: KAKUTA KOJI

    An IGZO sintered compact composed of indium (In), gallium (Ga), zinc (Zn), oxygen (O) and unavoidable impurities, wherein an average length of cracks existing in the IGZO sintered compact is 3 μm or more and 15 μm or less. Provided is a sputtering target capable of suppressing the target cracks and reducing the generation of particles during deposition via DC sputtering, and forming favorable thin films.

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    Zugriff

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    Titel:

    Oxide sintered compact and sputtering target formed from said oxide sintered compact

    Beteiligte:

    YAMAGUCHI YOHEI (Autor:in) / KAKUTA KOJI (Autor:in)

    Erscheinungsdatum:

    14.08.2018

    Medientyp:

    Patent

    Format:

    Elektronische Ressource

    Sprache:

    Englisch

    Klassifikation:

    IPC:  C04B Kalk , LIME / C23C Beschichten metallischer Werkstoffe , COATING METALLIC MATERIAL

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