Plasma-Enhanced Deposition of Tungsten, Molybdenum, and Tungsten Silicide Films

C. C. Tang (Autor:in) / J. K. Chu (Autor:in) / D. W. Hess (Autor:in)

1982

5 pages

Report

Keine Angabe

Englisch

Manufacturing Processes & Materials Handling , Manufacturing, Planning, Processing & Control , Refractory Metals & Alloys , Coatings, Colorants, & Finishes , Metal oxide semiconductors , Integrated circuits , Semiconducting films , Vapor deposition , Tungsten , Chemicals , Circuit interconnections , Silicides , Polycrystalline , Crystal growth , Refractory metals , Sputtering , Reprints , Plasmas(Physics) , Molybdenum , Polysilicons , Plasma deposited films , VLSI(Very Large Scale Integration) , Chemical vapor deposition , Tungsten silicide films