Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
LITHOGRAPHY - Using phase shifting to extend 248nm litho beyond the 50nm gate process - 248nm lithography can be used down to the 100nm node using a dark-field AltPSM double-exposure process, but can it print gates below 50nm?
LITHOGRAPHY - Using phase shifting to extend 248nm litho beyond the 50nm gate process - 248nm lithography can be used down to the 100nm node using a dark-field AltPSM double-exposure process, but can it print gates below 50nm?
LITHOGRAPHY - Using phase shifting to extend 248nm litho beyond the 50nm gate process - 248nm lithography can be used down to the 100nm node using a dark-field AltPSM double-exposure process, but can it print gates below 50nm?
Fang, C.Y. (Autor:in) / Hung, K.C. / Huang, Z.X. / Hsu, S.H. / Huang, J.
2003
Aufsatz (Zeitschrift)
Englisch
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