Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Ion Beam and Plasma-Induced Etching in Structuring Electronic Devices
Abstract This paper describes principles and practical applications of ion beam and plasma-induced etching for microcircuit fabrication, particularly in relation to etching of cadmium-mercury-telluride.
Ion Beam and Plasma-Induced Etching in Structuring Electronic Devices
Abstract This paper describes principles and practical applications of ion beam and plasma-induced etching for microcircuit fabrication, particularly in relation to etching of cadmium-mercury-telluride.
Ion Beam and Plasma-Induced Etching in Structuring Electronic Devices
Fischer, K. (Autor:in) / Möhl, W. (Autor:in)
01.01.1990
3 pages
Aufsatz/Kapitel (Buch)
Elektronische Ressource
Englisch
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