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Ion Beam and Plasma-Induced Etching in Structuring Electronic Devices
Abstract This paper describes principles and practical applications of ion beam and plasma-induced etching for microcircuit fabrication, particularly in relation to etching of cadmium-mercury-telluride.
Ion Beam and Plasma-Induced Etching in Structuring Electronic Devices
Abstract This paper describes principles and practical applications of ion beam and plasma-induced etching for microcircuit fabrication, particularly in relation to etching of cadmium-mercury-telluride.
Ion Beam and Plasma-Induced Etching in Structuring Electronic Devices
Fischer, K. (author) / Möhl, W. (author)
1990-01-01
3 pages
Article/Chapter (Book)
Electronic Resource
English
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