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Temperature Facilitated ECR-Etching for Isotropic SiC Structuring
Temperature Facilitated ECR-Etching for Isotropic SiC Structuring
Temperature Facilitated ECR-Etching for Isotropic SiC Structuring
Niebelschutz, F. ( Autor:in ) / Stauden, T. ( Autor:in ) / Tonisch, K. ( Autor:in ) / Pezoldt, J. ( Autor:in ) / Bauer, A.J. / Friedrichs, P. / Krieger, M. / Pensl, G. / Rupp, R. / Seyller, T.
01.01.2010
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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