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    A model for low pressure chemical vapor deposition in a hot-wall tubular reactor

    New search for: Houf, W. G.
    New search for: Grcar, J. F.
    New search for: Breiland, W. G.

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    A model for low pressure chemical vapor deposition in a hot-wall tubular reactor

    New search for: Houf, W. G.
    New search for: Grcar, J. F.
    New search for: Breiland, W. G.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    A model for low pressure chemical vapor deposition in a hot-wall tubular reactor

    New search for: Houf, W. G.
    New search for: Grcar, J. F.
    New search for: Breiland, W. G.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    A model for low pressure chemical vapor deposition in a hot-wall tubular reactor

    Contributors:

    Houf, W. G. (author) / Grcar, J. F. (author) / Breiland, W. G. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 17 ; 163

    Publication date:

    1993-01-01

    Size:

    163 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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