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Physisorption of krypton on thermally oxidized silicon wafers

Bohra, J. N. / John, P. T. / Saxena, R. K.

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Physisorption of krypton on thermally oxidized silicon wafers

Bohra, J. N. / John, P. T. / Saxena, R. K.

Physisorption of krypton on thermally oxidized silicon wafers

Bohra, J. N. / John, P. T. / Saxena, R. K.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Physisorption of krypton on thermally oxidized silicon wafers

Contributors:

Bohra, J. N. (author) / John, P. T. (author) / Saxena, R. K. (author)

Published in:

JOURNAL OF MATERIALS SCIENCE LETTERS ; 12 ; 1362

Publication date:

1993-01-01

Size:

1362 pages

ISSN:

0261-8028

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 620.11

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