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    A comparative study of TiSi~2 obtained by solid-state reaction and chemical vapor deposition

    New search for: Gouy-Pailler, P.
    New search for: Haond, M.
    New search for: Mathiot, D.
    New search for: Gauneau, M.
    New search for: Janssen, G. C. A. M.
    New search for: Jongste, J. F.
    New search for: Radelaar, S.

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    A comparative study of TiSi~2 obtained by solid-state reaction and chemical vapor deposition

    New search for: Gouy-Pailler, P.
    New search for: Haond, M.
    New search for: Mathiot, D.
    New search for: Gauneau, M.
    New search for: Janssen, G. C. A. M.
    New search for: Jongste, J. F.
    New search for: Radelaar, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    A comparative study of TiSi~2 obtained by solid-state reaction and chemical vapor deposition

    New search for: Gouy-Pailler, P.
    New search for: Haond, M.
    New search for: Mathiot, D.
    New search for: Gauneau, M.
    New search for: Janssen, G. C. A. M.
    New search for: Jongste, J. F.
    New search for: Radelaar, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
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    Document information
    Title:

    A comparative study of TiSi~2 obtained by solid-state reaction and chemical vapor deposition

    Contributors:

    Gouy-Pailler, P. (author) / Haond, M. (author) / Mathiot, D. (author) / Gauneau, M. (author) / Janssen, G. C. A. M. / Jongste, J. F. / Radelaar, S.

    Published in:

    Proceedings of the Fifth European Workshop on Refractory Metals and Silicides ; 25

    APPLIED SURFACE SCIENCE ; 72

    Publication date:

    1993-01-01

    Size:

    25 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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