Crystallization of amorphous thin low pressure chemical vapour deposition silicon films: in situ TEM measurement of grain growth rates

Guillemet, J. P. / De Mauduit, B. / Pieraggi, B. et al. | British Library Online Contents | 1993

Growth of Titanium Dioxide Thin Films by LPCVD

Li, W.-y. / Li, G. / Cai, X. et al. | British Library Online Contents | 2003

Thermal-induced normal grain growth mechanism in LPCVD polysilicon film

Akhtar, J. / Lamichhane, S. K. / Sen, P. | British Library Online Contents | 2005

In situ transmission electron microscopy study of the nucleation and grain growth of Ge2Sb2Te5 thin films

Park, Y. J. / Lee, J. Y. / Kim, Y. T. | British Library Online Contents | 2006

Chemical Composition of Silicon Nitride Thin Films Prepared by LPCVD

Ge, Q.-m. / Liu, X.-j. / Huang, Z.-y. et al. | British Library Online Contents | 2006