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    Threshold stress intensity for oxidative crack healing in sintered silicon nitride

    New search for: Ogasawara, T.
    New search for: Hori, T.
    New search for: Okada, A.

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    Threshold stress intensity for oxidative crack healing in sintered silicon nitride

    New search for: Ogasawara, T.
    New search for: Hori, T.
    New search for: Okada, A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Threshold stress intensity for oxidative crack healing in sintered silicon nitride

    New search for: Ogasawara, T.
    New search for: Hori, T.
    New search for: Okada, A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Threshold stress intensity for oxidative crack healing in sintered silicon nitride

    Contributors:

    Ogasawara, T. (author) / Hori, T. (author) / Okada, A. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE LETTERS ; 13 ; 404

    Publication date:

    1994-01-01

    Size:

    404 pages

    ISSN:

    0261-8028

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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