Electrical behavior of low-power RF magnetron-sputtered indium tin oxide films on silicon substrate: Fid-Bau Portal

Electrical behavior of low-power RF magnetron-sputtered indium tin oxide films on silicon substrate

Chiou, B.-S. / Hsieh, S.-T. / Wu, W.-F.

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Electrical behavior of low-power RF magnetron-sputtered indium tin oxide films on silicon substrate

Chiou, B.-S. / Hsieh, S.-T. / Wu, W.-F.

Electrical behavior of low-power RF magnetron-sputtered indium tin oxide films on silicon substrate

Chiou, B.-S. / Hsieh, S.-T. / Wu, W.-F.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Electrical behavior of low-power RF magnetron-sputtered indium tin oxide films on silicon substrate

Contributors:

Chiou, B.-S. (author) / Hsieh, S.-T. (author) / Wu, W.-F. (author)

Published in:

APPLIED SURFACE SCIENCE ; 74 ; 297

Publication date:

1994-01-01

Size:

297 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 621.35

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