A platform for research: civil engineering, architecture and urbanism
New dry-etch chemistries for III-V semiconductors
New dry-etch chemistries for III-V semiconductors
New dry-etch chemistries for III-V semiconductors
Pearton, S. J. (author) / Chakrabarti, U. K. (author) / Ren, F. (author) / Abernathy, C. R. (author)
1994-01-01
179 pages
Article (Journal)
Unknown
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Comparison of plasma etch chemistries for MgO
British Library Online Contents | 2001
|Dry etch chemistries for TiO2 thin films
British Library Online Contents | 2001
|Optical diagnostics of plasma chemistries and chamber conditions in gate oxide stack etch
British Library Online Contents | 2013
|Interhalogen plasma chemistries for dry etch patterning of Ni, Fe, NiFe and NiFeCo thin films
British Library Online Contents | 1999
|