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On the chemical vapour deposition of Ti~3SiC~2 from TiCl~4-SiCl~4-CH~4-H~2 gas mixtures. Part I A thermodynamic approach
On the chemical vapour deposition of Ti~3SiC~2 from TiCl~4-SiCl~4-CH~4-H~2 gas mixtures. Part I A thermodynamic approach
On the chemical vapour deposition of Ti~3SiC~2 from TiCl~4-SiCl~4-CH~4-H~2 gas mixtures. Part I A thermodynamic approach
Racault, C. (author) / Langlais, F. (author) / Bernard, C. (author)
JOURNAL OF MATERIALS SCIENCE ; 29 ; 5023
1994-01-01
5023 pages
Article (Journal)
Unknown
DDC:
620.11
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