A platform for research: civil engineering, architecture and urbanism
Influence of ion bombardment on the refractive index of laser pulse deposited oxide films
Influence of ion bombardment on the refractive index of laser pulse deposited oxide films
Influence of ion bombardment on the refractive index of laser pulse deposited oxide films
Reisse, G. (author) / Weissmantel, S. (author) / Keiper, B. (author) / Steiger, B. (author) / Dieleman, J. / Biermann, U. K. P. / Hess, P.
1995-01-01
107 pages
Article (Journal)
Unknown
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Influence of Ar impurities on optical refractive index of sputter deposited a-Si films
British Library Online Contents | 1997
|Influence of LN~2 substrate cooling on optical properties of laser-pulse-deposited oxide films
British Library Online Contents | 1995
|Thickness dependence of refractive index for anodic aluminium oxide films
British Library Online Contents | 1997
|Refractive-index-adjustment of SiO"2-GeO"2 films deposited by radio frequency magnetron sputtering
British Library Online Contents | 1999
|Chromium carbide thin films deposited by ultra-short pulse laser deposition
British Library Online Contents | 2009
|