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    Tunable UV-flash krypton lamp array useful for large area deposition and in situ UV annealing of Si-based dielectrics

    New search for: Flicstein, J.
    New search for: Vitel, Y.
    New search for: Dulac, O.
    New search for: Debauche, C.
    New search for: Dieleman, J.
    New search for: Biermann, U. K. P.
    New search for: Hess, P.

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    Tunable UV-flash krypton lamp array useful for large area deposition and in situ UV annealing of Si-based dielectrics

    New search for: Flicstein, J.
    New search for: Vitel, Y.
    New search for: Dulac, O.
    New search for: Debauche, C.
    New search for: Dieleman, J.
    New search for: Biermann, U. K. P.
    New search for: Hess, P.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Tunable UV-flash krypton lamp array useful for large area deposition and in situ UV annealing of Si-based dielectrics

    New search for: Flicstein, J.
    New search for: Vitel, Y.
    New search for: Dulac, O.
    New search for: Debauche, C.
    New search for: Dieleman, J.
    New search for: Biermann, U. K. P.
    New search for: Hess, P.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
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    Document information
    Title:

    Tunable UV-flash krypton lamp array useful for large area deposition and in situ UV annealing of Si-based dielectrics

    Contributors:

    Flicstein, J. (author) / Vitel, Y. (author) / Dulac, O. (author) / Debauche, C. (author) / Dieleman, J. / Biermann, U. K. P. / Hess, P.

    Published in:

    Photon-Assisted Processing of Surfaces and Thin Films ; 286

    APPLIED SURFACE SCIENCE ; 86

    Publication date:

    1995-01-01

    Size:

    286 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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