Residual Stress in Ion Implanted Titanium Nitride Studied by Parallel Beam Glancing Incidence X-Ray Diffraction: Fid-Bau Portal

Residual Stress in Ion Implanted Titanium Nitride Studied by Parallel Beam Glancing Incidence X-Ray Diffraction

Geist, D. E. / Perry, A. J. / Treglio, J. R. / Valvoda, V.

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Residual Stress in Ion Implanted Titanium Nitride Studied by Parallel Beam Glancing Incidence X-Ray Diffraction

Geist, D. E. / Perry, A. J. / Treglio, J. R. / Valvoda, V.

Residual Stress in Ion Implanted Titanium Nitride Studied by Parallel Beam Glancing Incidence X-Ray Diffraction

Geist, D. E. / Perry, A. J. / Treglio, J. R. / Valvoda, V.

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Check availability in my library

Order at Subito €

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Document information

Title:

Residual Stress in Ion Implanted Titanium Nitride Studied by Parallel Beam Glancing Incidence X-Ray Diffraction

Contributors:

Geist, D. E. (author) / Perry, A. J. (author) / Treglio, J. R. (author) / Valvoda, V. (author)

Published in:

ADVANCES IN X RAY ANALYSIS ; 471

Publication date:

1995-01-01

Size:

471 pages

ISSN:

0376-0308

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 539.7222

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