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    Real-time monitoring of heteroepitaxial growth processes on the silicon(001) surface by p-polarized reflectance spectroscopy

    New search for: Bachmann, K. J.
    New search for: Rossow, U.
    New search for: Dietz, N.
    New search for: Henini, M.
    New search for: Szweda, R.

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    Real-time monitoring of heteroepitaxial growth processes on the silicon(001) surface by p-polarized reflectance spectroscopy

    New search for: Bachmann, K. J.
    New search for: Rossow, U.
    New search for: Dietz, N.
    New search for: Henini, M.
    New search for: Szweda, R.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Real-time monitoring of heteroepitaxial growth processes on the silicon(001) surface by p-polarized reflectance spectroscopy

    New search for: Bachmann, K. J.
    New search for: Rossow, U.
    New search for: Dietz, N.
    New search for: Henini, M.
    New search for: Szweda, R.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

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    Document information
    Title:

    Real-time monitoring of heteroepitaxial growth processes on the silicon(001) surface by p-polarized reflectance spectroscopy

    Contributors:

    Bachmann, K. J. (author) / Rossow, U. (author) / Dietz, N. (author) / Henini, M. / Szweda, R.

    Published in:

    Low Dimensional Structures and Devices ; 472-478

    MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 35

    Publication date:

    1995-01-01

    Size:

    7 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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