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    Phosphorus and boron doping effects on solid phase recrystallization of polycrystalline silicon films amorphized by germanium ion implantation

    New search for: Kang, M.-Y.
    New search for: Yamamoto, T.
    New search for: Matsui, T.
    New search for: Kuwano, K.

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    Phosphorus and boron doping effects on solid phase recrystallization of polycrystalline silicon films amorphized by germanium ion implantation

    New search for: Kang, M.-Y.
    New search for: Yamamoto, T.
    New search for: Matsui, T.
    New search for: Kuwano, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Phosphorus and boron doping effects on solid phase recrystallization of polycrystalline silicon films amorphized by germanium ion implantation

    New search for: Kang, M.-Y.
    New search for: Yamamoto, T.
    New search for: Matsui, T.
    New search for: Kuwano, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
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    Document information
    Title:

    Phosphorus and boron doping effects on solid phase recrystallization of polycrystalline silicon films amorphized by germanium ion implantation

    Contributors:

    Kang, M.-Y. (author) / Yamamoto, T. (author) / Matsui, T. (author) / Kuwano, K. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE LETTERS ; 15 ; 343-344

    Publication date:

    1996-01-01

    Size:

    2 pages

    ISSN:

    0261-8028

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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