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Diffusion of ion-implanted boron impurities into pre-amorphized silicon

Ohno, N. / Hara, T. / Matsunaga, Y. / Current, M. I. / Inoue, M.

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Diffusion of ion-implanted boron impurities into pre-amorphized silicon

Ohno, N. / Hara, T. / Matsunaga, Y. / Current, M. I. / Inoue, M.

Diffusion of ion-implanted boron impurities into pre-amorphized silicon

Ohno, N. / Hara, T. / Matsunaga, Y. / Current, M. I. / Inoue, M.

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Document information

Title:

Diffusion of ion-implanted boron impurities into pre-amorphized silicon

Contributors:

Ohno, N. (author) / Hara, T. (author) / Matsunaga, Y. (author) / Current, M. I. (author) / Inoue, M. (author)

Published in:

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 3 ; 221-225

Publication date:

2000-01-01

Size:

5 pages

ISSN:

1369-8001

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.38152

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